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How to create vacuum(etching device) analysis |
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December 2, 2017, 23:58 |
How to create vacuum(etching device) analysis
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#1 |
New Member
KOEI MIYATA
Join Date: Dec 2017
Location: JAPAN
Posts: 1
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Hello everyone
This is my first post. I am analyzing etching equipment. Although the etching apparatus originally uses plasma, I want to treat the plasma as a thermal fluid and know how much heat acts on the inner wall of the etching apparatus. I would like to release thermal fluid (gas other than air) from the inlet of the image below into the vacuum domain (air). What should I do? Also, which model should be used? I think this is a multiphase flow of air (close to vacuum) and some kind of gas. |
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July 25, 2018, 11:38 |
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#2 |
New Member
asdf;lkj
Join Date: Jul 2018
Posts: 6
Rep Power: 8 |
KOEI MIYATA,
could you please assist me if you found the solution to create vacuum |
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Tags |
ansys fluent, etching device, vacuum chamber |
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