Has anyone worked on modeling the hydrodynamics, heat transfer, gas phase and surface reactions in chemical reactors? I am modeling the silcon deposition onto a silicon wafer surface. What kinds of numerical difficulties have you run into, if any? I would like to chat with you.

CFD-ACE+ from CFDRC Research Corp. is the leading CFD solver suite used for modeling semiconductor processes/equipment including a range of CVD processes. You can find more information at:

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R. Sukumar CFD Research Corporation