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CFD Events Calendar, Event Record #23345

Modeling Remote Plasma Sources Webinar
We would like to invite you to register for our complimentary CFD Multiphysics Webinar on Modeling Remote Plasma Sources.
Date: June 9, 2016
Contact Email: Michelle McDowell
Special Fields: Multiphysics
Type of Event: Online Event, International

Remote Plasma Sources (RPS) are becoming popular in the semiconductor industry demonstrating advantages beyond the conventional chamber cleaning, photo-resist removal, and stripping applications. In RPS, the plasma is upstream from the wafer and only the activated species diffuse downstream to react with wafer thereby minimizing the wafer damage from the bombardment of high energy ions. However, the transport of activated species from the plasma source to the process chamber is critical and complicated. In this webinar, we discuss how ACE+ Suite is ideal for modeling and process with dedicated features including: - ICP Model for inductively coupled discharges - DBD Model and CCP Model for capacitively coupled discharges - Global Model for analyzing complex multidimensional reaction pathways We will start with an overview of above Plasma Modeling features in ACE+ Suite and relevant industrial examples. We will then give a live demonstration of ACE+ Suite on a remote plasma source configuration and conclude with an interactive Q&A session.
Event record first posted on May 20, 2016, last modified on May 20, 2016

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